02 od
RSS 02 odHigh Optical Density Photomasks for Large Exposure Applications
White Paper Since the introduction of projection lithography in semiconductor manufacture, photomasks have been coated with 800 Å to 1000 Å of Cr film to achieve an OD of 3.0 ± 0.2 at g, h and i-line Mercury (Hg)... [30 Apr 2004]
